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Friday, 18 May 2012

Sisvel Achieves Critical Mass for a New Joint Platform in Licensing 4G Technology: LTE/SAE Patent Pool Group Expands to 32 Industry Leaders

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Reported by: ASIANET/UNB
Reported on: April 26, 2010 18:38 PM
Reported in: Technology

HONG KONG, Apr. 26 (AsiaNet/UNB), Sisvel announced today that 32 companies are now participating in its facilitation process to create an LTE/SAE patent pool. The group, which just concluded a general meeting in Hong Kong on April 21st and 22nd, joins LTE/SAE patent owners from the entire spectrum of relevant industries, including telecommunications companies (both network operators and equipment vendors), consumer electronics and integrated circuit manufacturers, and research institutes from China, Japan, Korea, Europe, and North America. Based on declarations of essentiality to standardization bodies, such as ETSI and TTA, these 32 companies hold over 60 percent of the intellectual property relevant for the emerging LTE/SAE standard.

"With such a substantial portion of the relevant intellectual property represented in its facilitation process, Sisvel is uniquely positioned to build a pool that will have a historic impact on patent licensing in the wireless world," explained Giustino de Sanctis, Managing Director of Sisvel Germany. "With this critical mass in both breadth and substance, this group can establish a powerful yet fundamentally balanced pool that will benefit the LTE ecosystem as a whole by providing more certainty and predictability around licensing terms and costs, while also creating a more level playing field for all stakeholders," Mr. de Sanctis continued.

"There is a widespread understanding that the IP landscape in LTE/SAE is more complex and diverse when compared to previous generations of telecommunications standards," Mr. de Sanctis added. "And LTE/SAE should have a joint licensing platform that reflects that landscape." Participating LTE/SAE stakeholders are moving forward together in shaping the direction for licensing 4G technology, and will meet again in mid-June in Washington, DC.

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